{"id":46122,"date":"2026-07-18T19:51:07","date_gmt":"2026-07-19T00:51:07","guid":{"rendered":"https:\/\/www.geomembranas.com.co\/geomembranas\/?p=46122"},"modified":"2026-07-18T19:51:12","modified_gmt":"2026-07-19T00:51:12","slug":"confident-versus-bad-photoresist-a-thorough-self-help-guide-to-photolithography-within-the-semiconductor-fabrication","status":"publish","type":"post","link":"https:\/\/www.geomembranas.com.co\/geomembranas\/confident-versus-bad-photoresist-a-thorough-self-help-guide-to-photolithography-within-the-semiconductor-fabrication\/","title":{"rendered":"Confident versus Bad Photoresist: A thorough Self-help guide to Photolithography within the Semiconductor Fabrication"},"content":{"rendered":"<div class=\"toc\" style=\"background: #f9f9f9;border: 1px solid #aaa;margin-bottom: 1em;padding: 1em;width: 350px\">\n<p style=\"font-weight: 700;text-align: center\">Content<\/p>\n<ul>\n<li><a href=\"#geopolitical-and-economic-uncertainties\">Geopolitical and you will economic uncertainties<\/a><\/li>\n<li><a href=\"#absorption-at-uv-and-shorter-wavelengths\">Consumption at the Ultraviolet and you can reduced wavelengths<\/a><\/li>\n<li><a href=\"#manufacturing-implementation-process-integration-and-control\">Creation Implementation: Procedure Consolidation and Manage<\/a><\/li>\n<li><a href=\"#hd-channels\">Hd streams<\/a><\/li>\n<\/ul>\n<\/div>\n<p>A summary of the newest developments as well as their risk examination will be prepared and you can updated on a daily basis, which have extreme risks showcased\/color-coded and you can said on in accounts. Furthermore, fostering a community from continuing studying and <a href=\"https:\/\/casinolead.ca\/150-free-spins-no-deposit\/\">this content<\/a> bringing opportunities to have elite invention can help banks build a strong ability pipe and you may mitigate the possibility of ability shortages. <!--more--> To address which difficulty, banks is to care for a hands-on way of compliance by frequently monitoring regulating changes, improving internal controls, and you will fostering a community out of compliance on the organization.<\/p>\n<ul>\n<li>It celebrates the new time of your own signing, inside the 1987, of the Montreal Process, a great landmark agreement in order to stage out compounds you to deplete the newest ozone layer.<\/li>\n<li>Liquidity chance is the chance you to a financial will run from physical currency, as well as if it can also be&#x2019;t convert its almost every other possessions on the cash fast enough.<\/li>\n<li>To lower its exposure publicity, they are able to financing money to people which have good credit histories, transact with high-top quality counterparties, or own equity to give cerdibility to the new fund.<\/li>\n<li>The working platform boasts an animated movie you to imagines what can have took place in case your ozone layer wasn&#8217;t stored.<\/li>\n<li>Photoresists has three big section, a good solvent, resin, and you can sensitizer (or photoactive compound).<\/li>\n<\/ul>\n<p>Some advantages in addition to trust climate changes could lead to extended and far more extreme cooler every now and then on account of changes in snap models or any other atmospheric things. At the step 1.5&#xB0;C of warming, 70 % to help you 90 percent from corals, the newest pillars of numerous undersea ecosystems, create pass away. The newest IPCC learned that in the 2&#xB0;C of warming, more than 2 billion somebody perform regularly be exposed to high temperature than they would during the step one.5&#xB0;C. The newest Paris Contract on the climate change is designed to limit average international temperatures increase to &#x201C;better less than&#x201D; 2&#xB0;C, and you will essentially to 1.5&#xB0;C, as the pre-commercial times. Indeed, small temperatures increases can be place the nation&#x2019;s sensitive ecosystems to your disarray, having dire ramifications for humans and other way of life anything. When you&#8217;re climate transform is actually an organic processes human hobby are driving it for the overdrive.<\/p>\n<p>Really inorganic product made use of while the substrates for microfabrication (silicon, glass) have an enthusiastic hydrophilic epidermis, and you can, after the tidy up steps, a certain degree of wetness will be introduce for the wafer. The newest solvent dilutes the newest polymer in order to liquid form to utilize that have spin-level deposition tips. For ArF lithography, the brand new polymer product are much more diversed nevertheless the anchor is usually a variety of methyl methacrylate (MMA), t-butylmethacrylate (TBMA), and methacrylic acidic (MAA). A few of the main differences between both would be the sidewalls mountain, resistance to etching, resolution, adhesion for the substrate, an such like.. Photolithography are a series out of control tips which allows in order to put and you can trend a great photosensitve polymer slim movie, the newest photoresist, for the a good substrate. They constitutes an excellent polymer (resin), a great sensitizer (photoactive compound), and you may a good solvent.<\/p>\n<p><img decoding=\"async\" src=\"http:\/\/2.bp.blogspot.com\/-YRNzcVhSAqw\/Uj9BVlZQ_NI\/AAAAAAAABnQ\/C09i0UBR85s\/s1600\/blowout.jpg\" alt=\"best online casino 2020 canada\" align=\"right\" border=\"0\"><\/p>\n<p>This approach stresses repairing ecosystems and increasing environment characteristics to guard people from the negative impacts out of climate change, house degradation, biodiversity losses, contaminants, and you may spend. This process is vital to have environment change type and make sure the brand new proceeded and renewable supply out of important services such brush liquid, fertile soil, and you can biodiversity preservation. Acknowledging the new interconnectedness out of pure possibilities and you may person things saves the new stability and you will resilience out of ecosystems when confronted with demands such as weather transform, environment destruction, as well as over-exploitation. Ecosystem-founded means is steps such as integrated liquid investment administration, included seaside zone government, marine spatial thought, ecosystem-dependent version and you will ecosystem-dependent chance prevention. This method stresses fixing ecosystems and you may enhancing ecosystem characteristics to safeguard neighborhood on the bad has an effect on of weather change, home destruction, biodiversity losings, pollution and you may spend.<\/p>\n<p>Acidic diffusion is essential not only to increase photoresist sensitivity and you will throughput, as well as in order to limit range border roughness due to try noise analytics. Chemical compounds amplification is also have a tendency to included in electron-ray exposures to boost the new susceptibility on the exposure serving. Photoresists utilized in design for DUV and smaller frequencies require use of chemicals amplification to increase the new sensitiveness to your coverage energy. When it comes to a confident photoresist, the new pictures-sensitive thing are degraded by light, and the designer usually dissolve aside the new places that have been opened to white, leaving a level where the hide try place. A designed cover up will be applied to the outside so you can cut off white, in order that simply unmasked areas of the information presented was unsealed to help you white.<\/p>\n<ul>\n<li>They typically excursion a distance for the purchase of several nanometers before being contains; for example a big travel point try similar to the discharge of electrons because of thick oxide inside Uv EPROM in response to help you uv light.<\/li>\n<li>Modern Wise Tvs assistance applications, and Freeview Gamble.<\/li>\n<li>When confronted with Uv light, self-confident photoresists go through polymer strings scission from the unsealed portion, ultimately causing increased solubility in the creator service.<\/li>\n<li>Banking companies do so it because of the conducting research, form clear contractual loans, and you can overseeing the newest results from businesses to make certain they actually do maybe not introduce the brand new operational, cybersecurity, or conformity dangers.<\/li>\n<li>Because the Photoresists try non polar compounds, and you can silicone dioxide has a polar character, adhesion difficulties can be reveal between the two product.<\/li>\n<\/ul>\n<p>Within the 1987, the new places around the world adopted the newest Montreal Process, that has while the phased out 99 per cent from ozone-depleting ingredients and you will helped stop the brand new ozone layer&#x2019;s decline. Around the exact same date, researchers unearthed that the newest ozone covering more than Antarctica had thinned dramatically, probably due to CFCs. The fresh ozone molecules giving the new covering their identity sop up ultraviolet rays regarding the sun, and Ultraviolet-B. The brand new ozone level hovers 15 to help you 35 kms over the Environment&#x2019;s surface inside an area referred to as stratosphere. Once getting together with a feverish mountain regarding the eighties, concerns for the newest &#x201C;hole&#x201D; in the ozone coating have receded. Montzka is on the brand new frontlines from a global energy to trace the condition of the fresh ozone coating, the fresh invisible protect you to definitely handles Environment from the sunlight&#x2019;s ultraviolet radiation.<\/p>\n<h2 id=\"absorption-at-uv-and-shorter-wavelengths\">Assimilation in the Ultraviolet and you can quicker wavelengths<\/h2>\n<p><img decoding=\"async\" src=\"https:\/\/is1-ssl.mzstatic.com\/image\/thumb\/Purple125\/v4\/51\/24\/d5\/5124d520-a99c-48f8-a8e7-cf30dfdd76c1\/pr_source.jpg\/750x750bb.jpeg\" alt=\"best online casino mega moolah\" align=\"left\" border=\"0\"><\/p>\n<p>The new adhesion functions is going to be observed and examined having a good goniometer attempt. So you can reliably do brief have, top of the silicone wafer should be made hydrophobic so you can offer photoresist adhesion. The newest material is applied to the brand new silicon wafer inside drinking water mode and you will polymerization is actually controlled as a result of experience of light. Photoresists provides around three biggest components, a great solvent, resin, and you will sensitizer (or photoactive compound). The brand new cover-up enables exact command over the newest doping and you can etching procedure familiar with form gadgets to the silicone polymer wafers.<\/p>\n<h2 id=\"manufacturing-implementation-process-integration-and-control\">Creation Execution: Procedure Consolidation and you may Manage<\/h2>\n<p>Inside photolithography, photoresist ingredients can be used create an excellent mask on the surface away from a silicone wafer. The brand new toxins communication anywhere between all of the different components and also the epidermis of the silicon wafer makes photolithography an interesting chemistry situation. Use nitrogen-purged shops systems, look after temperature during the 5&#xB1;2&#xB0;C, and you will expose restrict queue day limits (usually cuatro-8 times post-coating).<\/p>\n<h2 id=\"hd-channels\">High definition avenues<\/h2>\n<p>If the bank provides an inadequate They system, the options will get falter, disrupting support service. Such as, if workers are poorly instructed, they might create far more mistakes one cost the lending company time and money to improve. Other kinds of chance in the financial, such political imbalance otherwise disasters, also increase business chance. A financial can then tailor a customers&#x2019;s credit arrangement to own tighter or looser words, dependent on the amount of chance. Very first &#8216;s the lender&#x2019;s complete budget regarding exactly how much losses they can take while you are nevertheless to be able to efforts efficiently within its financial exposure government construction.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>Content Geopolitical and you will economic uncertainties Consumption at the Ultraviolet and you can reduced wavelengths Creation Implementation: Procedure Consolidation and Manage Hd streams A summary of the newest developments as well as their risk examination will be prepared and you can updated on a daily basis, which have extreme risks showcased\/color-coded and you can [&hellip;]<\/p>\n","protected":false},"author":5,"featured_media":0,"comment_status":"closed","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_joinchat":[]},"categories":[1],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v20.11 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Confident versus Bad Photoresist: A thorough Self-help guide to Photolithography within the Semiconductor Fabrication - Geosoluciones de Ingenier\u00eda<\/title>\n<meta name=\"description\" content=\"ContentGeopolitical and you will economic uncertaintiesConsumption at the Ultraviolet and you can reduced wavelengthsCreation Implementation: Procedure\" \/>\n<meta name=\"robots\" content=\"noindex, follow\" \/>\n<meta property=\"og:locale\" content=\"es_ES\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Confident versus Bad Photoresist: A thorough Self-help guide to Photolithography within the Semiconductor Fabrication - Geosoluciones de Ingenier\u00eda\" \/>\n<meta property=\"og:description\" content=\"ContentGeopolitical and you will economic uncertaintiesConsumption at the Ultraviolet and you can reduced wavelengthsCreation Implementation: Procedure\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.geomembranas.com.co\/geomembranas\/confident-versus-bad-photoresist-a-thorough-self-help-guide-to-photolithography-within-the-semiconductor-fabrication\/\" \/>\n<meta property=\"og:site_name\" content=\"Geosoluciones de Ingenier\u00eda\" \/>\n<meta property=\"article:publisher\" content=\"https:\/\/www.facebook.com\/Geomembranas-SAS-Grupo-Geosoluciones-de-Ingenier%c3%ada-685713601493257\" \/>\n<meta property=\"article:published_time\" content=\"2026-07-19T00:51:07+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2026-07-19T00:51:12+00:00\" \/>\n<meta property=\"og:image\" content=\"http:\/\/2.bp.blogspot.com\/-YRNzcVhSAqw\/Uj9BVlZQ_NI\/AAAAAAAABnQ\/C09i0UBR85s\/s1600\/blowout.jpg\" \/>\n<meta name=\"author\" content=\"David Marulanda\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:label1\" content=\"Escrito por\" \/>\n\t<meta name=\"twitter:data1\" content=\"David Marulanda\" \/>\n\t<meta name=\"twitter:label2\" content=\"Tiempo estimado de lectura\" \/>\n\t<meta name=\"twitter:data2\" content=\"7 minutos\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"Article\",\"@id\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/confident-versus-bad-photoresist-a-thorough-self-help-guide-to-photolithography-within-the-semiconductor-fabrication\/#article\",\"isPartOf\":{\"@id\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/confident-versus-bad-photoresist-a-thorough-self-help-guide-to-photolithography-within-the-semiconductor-fabrication\/\"},\"author\":{\"name\":\"David Marulanda\",\"@id\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/#\/schema\/person\/a5356f2f6d75ac756edda28e8cadcf7a\"},\"headline\":\"Confident versus Bad Photoresist: A thorough Self-help guide to Photolithography within the Semiconductor Fabrication\",\"datePublished\":\"2026-07-19T00:51:07+00:00\",\"dateModified\":\"2026-07-19T00:51:12+00:00\",\"mainEntityOfPage\":{\"@id\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/confident-versus-bad-photoresist-a-thorough-self-help-guide-to-photolithography-within-the-semiconductor-fabrication\/\"},\"wordCount\":1518,\"publisher\":{\"@id\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/#organization\"},\"inLanguage\":\"es-CO\"},{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/confident-versus-bad-photoresist-a-thorough-self-help-guide-to-photolithography-within-the-semiconductor-fabrication\/\",\"url\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/confident-versus-bad-photoresist-a-thorough-self-help-guide-to-photolithography-within-the-semiconductor-fabrication\/\",\"name\":\"Confident versus Bad Photoresist: A thorough Self-help guide to Photolithography within the Semiconductor Fabrication - Geosoluciones de Ingenier\u00eda\",\"isPartOf\":{\"@id\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/#website\"},\"datePublished\":\"2026-07-19T00:51:07+00:00\",\"dateModified\":\"2026-07-19T00:51:12+00:00\",\"description\":\"ContentGeopolitical and you will economic uncertaintiesConsumption at the Ultraviolet and you can reduced wavelengthsCreation Implementation: Procedure\",\"inLanguage\":\"es-CO\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.geomembranas.com.co\/geomembranas\/confident-versus-bad-photoresist-a-thorough-self-help-guide-to-photolithography-within-the-semiconductor-fabrication\/\"]}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/#website\",\"url\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/\",\"name\":\"Geosoluciones de Ingenier\u00eda\",\"description\":\"Somos una empresa que a trav\u00e9s del uso adecuado de los geosint\u00e9ticos, construimos soluciones de ingenier\u00eda que mejoran los procesos productivos en los sectores de la Construcci\u00f3n, Infraestructura, Miner\u00eda, Petr\u00f3leo y Gas, Agroindustrial y Ambiental\",\"publisher\":{\"@id\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/#organization\"},\"potentialAction\":[{\"@type\":\"SearchAction\",\"target\":{\"@type\":\"EntryPoint\",\"urlTemplate\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/?s={search_term_string}\"},\"query-input\":\"required name=search_term_string\"}],\"inLanguage\":\"es-CO\"},{\"@type\":\"Organization\",\"@id\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/#organization\",\"name\":\"GeoSoluciones\",\"url\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/\",\"logo\":{\"@type\":\"ImageObject\",\"inLanguage\":\"es-CO\",\"@id\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/#\/schema\/logo\/image\/\",\"url\":\"\",\"contentUrl\":\"\",\"caption\":\"GeoSoluciones\"},\"image\":{\"@id\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/#\/schema\/logo\/image\/\"},\"sameAs\":[\"https:\/\/www.facebook.com\/Geomembranas-SAS-Grupo-Geosoluciones-de-Ingenier\u00eda-685713601493257\",\"https:\/\/www.instagram.com\/geosoluciones1995\/\",\"https:\/\/www.linkedin.com\/company\/geosolucionesdeingenieria\/mycompany\/?viewAsMember=true\",\"https:\/\/www.youtube.com\/channel\/UCR672LUrNqpykadGb7p7TnQ\"]},{\"@type\":\"Person\",\"@id\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/#\/schema\/person\/a5356f2f6d75ac756edda28e8cadcf7a\",\"name\":\"David Marulanda\",\"image\":{\"@type\":\"ImageObject\",\"inLanguage\":\"es-CO\",\"@id\":\"https:\/\/www.geomembranas.com.co\/geomembranas\/#\/schema\/person\/image\/\",\"url\":\"https:\/\/secure.gravatar.com\/avatar\/73c881716a4545fa9d9c2c6b74035e61?s=96&d=mm&r=g\",\"contentUrl\":\"https:\/\/secure.gravatar.com\/avatar\/73c881716a4545fa9d9c2c6b74035e61?s=96&d=mm&r=g\",\"caption\":\"David Marulanda\"}}]}<\/script>\n<!-- \/ Yoast SEO plugin. -->","yoast_head_json":{"title":"Confident versus Bad Photoresist: A thorough Self-help guide to Photolithography within the Semiconductor Fabrication - Geosoluciones de Ingenier\u00eda","description":"ContentGeopolitical and you will economic uncertaintiesConsumption at the Ultraviolet and you can reduced wavelengthsCreation Implementation: Procedure","robots":{"index":"noindex","follow":"follow"},"og_locale":"es_ES","og_type":"article","og_title":"Confident versus Bad Photoresist: A thorough Self-help guide to Photolithography within the Semiconductor Fabrication - Geosoluciones de Ingenier\u00eda","og_description":"ContentGeopolitical and you will economic uncertaintiesConsumption at the Ultraviolet and you can reduced wavelengthsCreation Implementation: Procedure","og_url":"https:\/\/www.geomembranas.com.co\/geomembranas\/confident-versus-bad-photoresist-a-thorough-self-help-guide-to-photolithography-within-the-semiconductor-fabrication\/","og_site_name":"Geosoluciones de Ingenier\u00eda","article_publisher":"https:\/\/www.facebook.com\/Geomembranas-SAS-Grupo-Geosoluciones-de-Ingenier%c3%ada-685713601493257","article_published_time":"2026-07-19T00:51:07+00:00","article_modified_time":"2026-07-19T00:51:12+00:00","og_image":[{"url":"http:\/\/2.bp.blogspot.com\/-YRNzcVhSAqw\/Uj9BVlZQ_NI\/AAAAAAAABnQ\/C09i0UBR85s\/s1600\/blowout.jpg"}],"author":"David Marulanda","twitter_card":"summary_large_image","twitter_misc":{"Escrito por":"David Marulanda","Tiempo estimado de lectura":"7 minutos"},"schema":{"@context":"https:\/\/schema.org","@graph":[{"@type":"Article","@id":"https:\/\/www.geomembranas.com.co\/geomembranas\/confident-versus-bad-photoresist-a-thorough-self-help-guide-to-photolithography-within-the-semiconductor-fabrication\/#article","isPartOf":{"@id":"https:\/\/www.geomembranas.com.co\/geomembranas\/confident-versus-bad-photoresist-a-thorough-self-help-guide-to-photolithography-within-the-semiconductor-fabrication\/"},"author":{"name":"David Marulanda","@id":"https:\/\/www.geomembranas.com.co\/geomembranas\/#\/schema\/person\/a5356f2f6d75ac756edda28e8cadcf7a"},"headline":"Confident versus Bad Photoresist: A thorough Self-help guide to Photolithography within the Semiconductor Fabrication","datePublished":"2026-07-19T00:51:07+00:00","dateModified":"2026-07-19T00:51:12+00:00","mainEntityOfPage":{"@id":"https:\/\/www.geomembranas.com.co\/geomembranas\/confident-versus-bad-photoresist-a-thorough-self-help-guide-to-photolithography-within-the-semiconductor-fabrication\/"},"wordCount":1518,"publisher":{"@id":"https:\/\/www.geomembranas.com.co\/geomembranas\/#organization"},"inLanguage":"es-CO"},{"@type":"WebPage","@id":"https:\/\/www.geomembranas.com.co\/geomembranas\/confident-versus-bad-photoresist-a-thorough-self-help-guide-to-photolithography-within-the-semiconductor-fabrication\/","url":"https:\/\/www.geomembranas.com.co\/geomembranas\/confident-versus-bad-photoresist-a-thorough-self-help-guide-to-photolithography-within-the-semiconductor-fabrication\/","name":"Confident versus Bad Photoresist: A thorough Self-help guide to Photolithography within the Semiconductor Fabrication - Geosoluciones de Ingenier\u00eda","isPartOf":{"@id":"https:\/\/www.geomembranas.com.co\/geomembranas\/#website"},"datePublished":"2026-07-19T00:51:07+00:00","dateModified":"2026-07-19T00:51:12+00:00","description":"ContentGeopolitical and you will economic uncertaintiesConsumption at the Ultraviolet and you can reduced wavelengthsCreation Implementation: Procedure","inLanguage":"es-CO","potentialAction":[{"@type":"ReadAction","target":["https:\/\/www.geomembranas.com.co\/geomembranas\/confident-versus-bad-photoresist-a-thorough-self-help-guide-to-photolithography-within-the-semiconductor-fabrication\/"]}]},{"@type":"WebSite","@id":"https:\/\/www.geomembranas.com.co\/geomembranas\/#website","url":"https:\/\/www.geomembranas.com.co\/geomembranas\/","name":"Geosoluciones de Ingenier\u00eda","description":"Somos una empresa que a trav\u00e9s del uso adecuado de los geosint\u00e9ticos, construimos soluciones de ingenier\u00eda que mejoran los procesos productivos en los sectores de la Construcci\u00f3n, Infraestructura, Miner\u00eda, Petr\u00f3leo y Gas, Agroindustrial y Ambiental","publisher":{"@id":"https:\/\/www.geomembranas.com.co\/geomembranas\/#organization"},"potentialAction":[{"@type":"SearchAction","target":{"@type":"EntryPoint","urlTemplate":"https:\/\/www.geomembranas.com.co\/geomembranas\/?s={search_term_string}"},"query-input":"required name=search_term_string"}],"inLanguage":"es-CO"},{"@type":"Organization","@id":"https:\/\/www.geomembranas.com.co\/geomembranas\/#organization","name":"GeoSoluciones","url":"https:\/\/www.geomembranas.com.co\/geomembranas\/","logo":{"@type":"ImageObject","inLanguage":"es-CO","@id":"https:\/\/www.geomembranas.com.co\/geomembranas\/#\/schema\/logo\/image\/","url":"","contentUrl":"","caption":"GeoSoluciones"},"image":{"@id":"https:\/\/www.geomembranas.com.co\/geomembranas\/#\/schema\/logo\/image\/"},"sameAs":["https:\/\/www.facebook.com\/Geomembranas-SAS-Grupo-Geosoluciones-de-Ingenier\u00eda-685713601493257","https:\/\/www.instagram.com\/geosoluciones1995\/","https:\/\/www.linkedin.com\/company\/geosolucionesdeingenieria\/mycompany\/?viewAsMember=true","https:\/\/www.youtube.com\/channel\/UCR672LUrNqpykadGb7p7TnQ"]},{"@type":"Person","@id":"https:\/\/www.geomembranas.com.co\/geomembranas\/#\/schema\/person\/a5356f2f6d75ac756edda28e8cadcf7a","name":"David Marulanda","image":{"@type":"ImageObject","inLanguage":"es-CO","@id":"https:\/\/www.geomembranas.com.co\/geomembranas\/#\/schema\/person\/image\/","url":"https:\/\/secure.gravatar.com\/avatar\/73c881716a4545fa9d9c2c6b74035e61?s=96&d=mm&r=g","contentUrl":"https:\/\/secure.gravatar.com\/avatar\/73c881716a4545fa9d9c2c6b74035e61?s=96&d=mm&r=g","caption":"David Marulanda"}}]}},"_links":{"self":[{"href":"https:\/\/www.geomembranas.com.co\/geomembranas\/wp-json\/wp\/v2\/posts\/46122"}],"collection":[{"href":"https:\/\/www.geomembranas.com.co\/geomembranas\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.geomembranas.com.co\/geomembranas\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.geomembranas.com.co\/geomembranas\/wp-json\/wp\/v2\/users\/5"}],"replies":[{"embeddable":true,"href":"https:\/\/www.geomembranas.com.co\/geomembranas\/wp-json\/wp\/v2\/comments?post=46122"}],"version-history":[{"count":1,"href":"https:\/\/www.geomembranas.com.co\/geomembranas\/wp-json\/wp\/v2\/posts\/46122\/revisions"}],"predecessor-version":[{"id":46123,"href":"https:\/\/www.geomembranas.com.co\/geomembranas\/wp-json\/wp\/v2\/posts\/46122\/revisions\/46123"}],"wp:attachment":[{"href":"https:\/\/www.geomembranas.com.co\/geomembranas\/wp-json\/wp\/v2\/media?parent=46122"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.geomembranas.com.co\/geomembranas\/wp-json\/wp\/v2\/categories?post=46122"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.geomembranas.com.co\/geomembranas\/wp-json\/wp\/v2\/tags?post=46122"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}